Characterization of SiO2/SiC Interface of Phosphorous-Doped MOS Capacitors by Conductance Measurements
Crossref DOI link: https://doi.org/10.35940/ijrte.C5316.098319
Published Online: 2019-09-30
Update policy: https://doi.org/10.35940/beiesp.crossmarkpolicy
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Idris*, M. I.
Napiah, Z. A. F. M.
Zainudin, M. N. Shah
Chachuli, S. A. M.
Rashid, Marzaini