The effect of aluminum doping on crystallinity, non-lattice oxygen, and resistance switching of Al-doped HfO2 films deposited by reactive sputtering
Crossref DOI link: https://doi.org/10.3938/jkps.65.709
Published Online: 2014-09-24
Published Print: 2014-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lee, Kyumin
Na, Heedo
Sohn, Hyunchul
Kim, Jonggi
Text and Data Mining valid from 2014-09-01
