Effects of Ho- and Ni-doping alone and of co-doping on the structural and the electrical properties of BiFeO3 thin films
Crossref DOI link: https://doi.org/10.3938/jkps.66.1051
Published Online: 2015-04-16
Published Print: 2015-04
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kim, J. W.
Raghavan, C. M.
Choi, J. Y.
Kim, S. S.
Text and Data Mining valid from 2015-04-01