Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
Crossref DOI link: https://doi.org/10.3938/jkps.66.1885
Published Online: 2015-07-09
Published Print: 2015-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Choi, Jae-Sung
Park, Jea-Gun
Text and Data Mining valid from 2015-06-01