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Effect of bias voltage on the microstructure and hardness of Ti-Si-N films deposited by using high-power impulse magnetron sputtering

Crossref DOI link: https://doi.org/10.3938/jkps.68.351

Published Online: 2016-02-02

Published Print: 2016-01

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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