Effect of argon gas pressure on residual stress, microstructure evolution and electrical resistivity of beryllium films
Crossref DOI link: https://doi.org/10.3938/jkps.68.557
Published Online: 2016-03-03
Published Print: 2016-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Luo, Bing-Chi
Li, Kai
Zhang, Ji-Qiang
Luo, Jiang-Shan
Wu, Wei-Dong
Tang, Yong-Jian
Text and Data Mining valid from 2016-02-01