Spatially-Resolved Remote Plasma Atomic Layer Deposition Process for Moisture Barrier Al2O3 Films
Crossref DOI link: https://doi.org/10.3938/jkps.73.45
Published Online: 2018-07-11
Published Print: 2018-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Yong, Sang Heon
Kim, Sun Jung
Cho, Sung Min
Chae, Heeyeop
Text and Data Mining valid from 2018-07-01
Article History
Received: 16 April 2018
Accepted: 27 April 2018
First Online: 11 July 2018