Temperature- and Al/N ratio-dependent AlN seed layer formation on (110) Si substrates by using plasma-assisted molecular beam epitaxy
Crossref DOI link: https://doi.org/10.3938/jkps.64.1577
Published Online: 2014-06-05
Published Print: 2014-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Noh, Young-Kyun
Park, Chul-Hyun
Oh, Jae-Eung
Lee, Sang-Tae
Kim, Moon-Deock
Text and Data Mining valid from 2014-05-01