Effects of plasma-enhanced chemical vapor deposition (PECVD) on the carrier lifetime of Al2O3 passivation stack
Crossref DOI link: https://doi.org/10.3938/jkps.67.995
Published Online: 2015-10-02
Published Print: 2015-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Cho, Kuk-Hyun
Cho, Young Joon
Chang, Hyo Sik
Kim, Kyung-Joong
Song, Hee Eun
Text and Data Mining valid from 2015-09-01