Deposition Pressure Dependent Electric Properties of (Hf, Zr)O2 Thin Films Made by RF Sputtering Deposition Method
Crossref DOI link: https://doi.org/10.3938/jkps.73.1712
Published Online: 2018-12-19
Published Print: 2018-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Moon, S. E.
Kim, J. H.
Im, J. P.
Lee, J.
Im, S. Y.
Hong, S. H.
Kang, S. Y.
Yoon, S. M.
Text and Data Mining valid from 2018-12-01
Article History
Received: 9 November 2018
Accepted: 13 November 2018
First Online: 19 December 2018